Influence of Surface Sputtering during High-Intensity, Hot Ion Implantation on Deep Alloying of Martensitic Stainless Steel

This article is devoted to the study of effect ion sputtering on alloy surface, using example martensitic stainless steel AISI 420 with ultrahigh-dose, high-intensity nitrogen implantation efficiency accumulation and transformation depth distribution dopants. Some patterns change in doping depending target temperature range from 400 650 °C, current density 55 250 mA/cm2, fluence up 4.5 × 1021 ion/cm2 are studied. It has been experimentally established that a decrease coefficient surface due energy ions 1600 350 eV, while maintaining density, irradiation mode increases ion-doped layer by more than three times 25 μm 65 µm. The efficient diffusion at an many greater data obtained when nitrided flux about 2 mA/cm2.